摘要 |
PROBLEM TO BE SOLVED: To provide a sealing structure where oxidized dust during formation of a semiconductor film is not collected on the clean space side K and workability of mounting on a dovetail groove is excellent, and an elastic seal keeping an always stable and clean posture in the dovetail groove is provided. SOLUTION: The sealing structure comprises the elastic seal 1, a member 2 to be mounted having the dovetail groove 3, and a mating member 21. The elastic seal 1 is formed in a bilaterally asymmetrical shape in regard to a central line L, a high shoulder 12H is present on the clean space side K, and a middle shoulder 12L is present on the atmosphere side M. A space G is formed between the elastic seal 1 and an opening end 4b of the dovetail groove 3 from the middle shoulder 12L to a protrusion 9. COPYRIGHT: (C)2006,JPO&NCIPI
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