发明名称 Substrate having a zinc oxide nanowire array normal to its surface and fabrication method thereof
摘要 A method for forming an array of zinc oxide nanowires on a substrate is disclosed, which includes forming a crystal phase adjusting buffer on the surface of the substrate and growing 1D zinc oxide nanowires on the buffer by zinc vapor deposition, which are normal to the surface of the substrate. The crystal phase adjusting buffer includes, for example, nitride and oxide layers on a silicon substrate, or a gallium nitride epitaxial layer on a sapphire substrate, and is used as a growth buffer layer for the zinc oxide nanowires. The zinc vapor phase deposition includes forming a zinc oxide layer on the crystal phase adjusting buffer and forming vertical zinc oxide nanowires on the zinc oxide layer.
申请公布号 US2005223969(A1) 申请公布日期 2005.10.13
申请号 US20040822648 申请日期 2004.04.13
申请人 INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE 发明人 CHEN I-CHERNG;TSENG YUNG-KUAN;HUANG CHOR-JYE
分类号 B05D5/12;C30B23/00;C30B25/00;C30B25/02;C30B28/12;C30B28/14;(IPC1-7):B05D5/12 主分类号 B05D5/12
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