发明名称 |
Method of optical proximity correction using chamfers and rounding at corners |
摘要 |
Disclosed is a method of optimizing a design to be formed on a substrate. The method includes approximating rounding of at least one corner of an image of the design; generating a representation of the design further to the approximate rounding of the at least one corner; generating an initial representation of a mask utilized to image the design based on the representation; and performing Optical Proximity Correction (OPC) further to the initial representation of the mask. |
申请公布号 |
EP1584980(A2) |
申请公布日期 |
2005.10.12 |
申请号 |
EP20050252262 |
申请日期 |
2005.04.11 |
申请人 |
ASML MASKTOOLS B.V. |
发明人 |
LAIDIG, THOMAS;EURLINGS, MARKUS FRANCISCUS ANTONIUS |
分类号 |
G03B27/32;G03F1/00;G03F1/36;G06F17/50;H01L21/027 |
主分类号 |
G03B27/32 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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