发明名称 |
High flow rate gaseous reactant supply |
摘要 |
A gaseous reactant supply apparatus for turning high flow rates of gaseous supply approximately 90 degrees and providing a uniform distribution of gaseous supply. The gaseous supply passes through a venturi throat. Straightening vanes can be positioned inside the venturi throat to reduce rotational motion the gaseous reactant supply may have upon entering the venturi throat. The gaseous reactant supply apparatus exhibits lower pressure drops than exhibited by apparatus of the prior art.
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申请公布号 |
US2005220702(A1) |
申请公布日期 |
2005.10.06 |
申请号 |
US20040817740 |
申请日期 |
2004.04.02 |
申请人 |
MARTIN ROBERT O;NATALIE CHARLES A |
发明人 |
MARTIN ROBERT O.;NATALIE CHARLES A. |
分类号 |
B01J12/02;B01J19/26;B01J21/06;B01J37/02;C01B13/22;C01G23/07;C01G25/02;(IPC1-7):C01G23/047 |
主分类号 |
B01J12/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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