发明名称 CONVEYING MECHANISM OF SUBSTRATE
摘要 <P>PROBLEM TO BE SOLVED: To reduce the size and cost of a conveying mechanism and to prevent flaw and waste adhesion on a surface of a substrate, in a conveyance work in a substrate manufacturing process. <P>SOLUTION: Rollers 41-48 are disposed on a drawing table 30 of a drawing device 10, and many air vents AR are regularly formed on a supporting surface 30S of the table 30. The rollers 41 and 42 and rollers 43 and 44 (or 45 and 46, or 47 and 48) are arranged on the supporting surface 30S, and compressed air is blown off from the supporting surface 30S by a compressor. When the substrate SW is conveyed by a conveyor 70 and comes into the drawing table 30 in a floated state of the substrate SW, the substrate SW is moved to a predetermined position in the conveyance direction by driving of the rollers 42 and 44 (or 46 and 48). The gas between the substrate SW and the supporting surface 30S is decompressed via the air vents AR, and the substrate SW is mounted to the supporting surface 30S. <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2005272039(A) 申请公布日期 2005.10.06
申请号 JP20040084797 申请日期 2004.03.23
申请人 PENTAX CORP 发明人 SHIMIZU SHUICHI
分类号 G03F7/30;B65G49/06;G03F7/20;H01L21/027;H01L21/677;H01L21/68 主分类号 G03F7/30
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