| 摘要 |
PROBLEM TO BE SOLVED: To provide a method of creating a large two dimensional image by connecting small two dimensional images obtained for every beam in evaluating a pattern on a sample by scanning a plurality of beams; a pattern evaluation method having no problem of converging a primary beam finely and capable of effectively detecting also secondary electrons without any cross talk; a method of performing a CD measurement and measuring matching accuracy with high throughput; and a pattern evaluation method using an electronic optical system generating many multi-beams to the vicinity of one optical axis, effectively detecting a secondary electron signal from each beam when simultaneously scanning the beams, and having reduced stages of lenses. SOLUTION: The method is to irradiate a sample with a plurality of beams for the evaluation of a pattern, and comprises (a) a step of irradiating an electron beam emitted from an electron gun to a plurality of openings, (b) a step of focusing a reduced image of the opening onto a sample surface, (c) a step of obtaining a two dimensional image for every beam by scanning the plurality of the focused beams, (d) a step of forming a large two dimensional image by connecting the two dimensional images for every beam, (e) a step of measuring an interval in one axis direction among the plurality of the beams, and (f) a step of adjusting the foregoing interval to integer times of a pixel size. COPYRIGHT: (C)2006,JPO&NCIPI |
