发明名称 Electrostatic discharge semiconductor protection circuit of reduced area
摘要 A semiconductor device includes a substrate, a well region formed in the substrate, a field effect transistor formed in the well region, and a diffused region, formed across the well region and the substrate for applying back gate potential to the well region, and forming a PN junction together with its periphery. The field effect transistor and the PN junction are connected between terminals for absorbing excess current so that an internal circuit connected to the terminals is protected.
申请公布号 US6952037(B2) 申请公布日期 2005.10.04
申请号 US20030658781 申请日期 2003.09.10
申请人 MITSUMI ELECTRIC CO., LTD. 发明人 ISHIKAWA YASUHISA;WATANABE ATSUSHI;TERADA YUKIHIRO;IKEUCHI AKIRA;OYA HIROSHI
分类号 H01L27/04;H01L21/822;H01L23/60;H01L23/62;H01L27/02;H01L27/06;H01L29/78;(IPC1-7):H01L23/60 主分类号 H01L27/04
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