| 摘要 |
PROBLEM TO BE SOLVED: To provide a dual trap device having construction for preventing the corrosion of a process reaction by-product trap portion of a trap when process exhaust gas containing chlorine and hydrogen fluoride flows into the trap, without stopping the operation of a semiconductor manufacturing device, and to provide its regenerating method. SOLUTION: The trap device comprises the trap part arranged in an exhaust passage through which gas is exhausted from a sealed chamber with a vacuum pump for removing components in the exhaust gas deposited thereon. The trap portion having dual traps includes a trapping means for products in the exhaust gas, means of supplying alkaline solution and water as washing liquid for removing the products deposited on the trapping means, and a drain pipe for discharging solution neutralized with the washing liquid for the products. Its regenerating method is also provided. COPYRIGHT: (C)2005,JPO&NCIPI
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