| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method of correcting lithographic processing when forming an overlapping mark. <P>SOLUTION: Physical vapor depositing (PVD) is performed as if film were laminated on a wafer. Unsymmetrical deposition of the film on a side wall of opening portion relates to a variation of consumption of a target in the PVD treatment. Therefore, a location shift in the overlapping mark varies in each time duration. A formula relating to the consumption of the target and the location shift is extracted, and the formula is recorded on a controller system. A compensation value is obtained from the controller system, and it feeds back to next lithographic processing. Namely, error in a measurement of the overlapping mark can be reduced because the compensation value is fed back through the controller system so that the location shift in the overlapping mark brought from the consumption of the target in the PVD treatment may be corrected. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
