CLEANING SHEET AND CLEANING METHOD OF SUBSTRATE TREATMENT APPARATUS USING IT

摘要

PROBLEM TO BE SOLVED: To provide a cleaning member capable of shortening the reaching time to a prescribed degree of vacuum when fed into the vacuum substrate treatment apparatus to contribute to the enhancement of the rate of operation. SOLUTION: The cleaning sheet is constituted so that vapor deposition film comprising a metal film or a metal oxide film is formed on one side of a base film to constitute a support and a cleaning layer is provided on the vapor deposition film side of the support while a pressure-sensitive adhesive layer is provided on the side opposite to the vapor deposition film of the support. Especially, the normal coefficient of moisture absorption of the support is below 2.0 wt.%. This cleaning sheet is bonded to a feed member through the pressure-sensitive adhesive layer to obtain a feed member with a cleaning function. COPYRIGHT: (C)2005,JPO&NCIPI