发明名称 Method for front end of line fabrication
摘要 A method for removing native oxides from a substrate surface is provided. In at least one embodiment, the method includes supporting the substrate surface in a vacuum chamber and generating reactive species from a gas mixture within the chamber. The substrate surface is then cooled within the chamber and the reactive species are directed to the cooled substrate surface to react with the native oxides thereon and form a film on the substrate surface. The substrate surface is then heated within the chamber to vaporize the film.
申请公布号 US2005205110(A1) 申请公布日期 2005.09.22
申请号 US20050137609 申请日期 2005.05.24
申请人 APPLIED MATERIALS, INC. 发明人 KAO CHIEN-TEH;CHOU JING-PEI (CONNIE);LAI CHIUKIN (STEVEN);UMOTOY SAL;HUSTON JOEL M.;TRINH SON;CHANG MEI;YUAN XIAOXIONG (JOHN);CHANG YU;LU XINLIANG;WANG WEI W.;PHAN SEE-ENG
分类号 H01L21/28;C23C16/455;C23F1/00;H01J37/32;H01L21/00;H01L21/302;H01L21/3065;H01L21/3205;H01L21/8238;H01L23/12;H01L23/52;(IPC1-7):C25F1/00 主分类号 H01L21/28
代理机构 代理人
主权项
地址