| 发明名称 |
BLACK PHOTOSENSITIVE RESIN COMPOSITION |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a new black photosensitive resin composition which can form a color pattern with a wide margin and no production of residue. <P>SOLUTION: The black photosensitive resin composition contains: a black colorant (A); a binder resin (B); an addition polymerizable compound (C) having an ethylenically unsaturated bond; one kind or more kinds of photopolymerization initiators; a 12-24C aliphatic monocarboxylic acid (E); and a solvent (F). <P>COPYRIGHT: (C)2005,JPO&NCIPI |
| 申请公布号 |
JP2005258254(A) |
申请公布日期 |
2005.09.22 |
| 申请号 |
JP20040072241 |
申请日期 |
2004.03.15 |
| 申请人 |
SUMITOMO CHEMICAL CO LTD |
发明人 |
MURO SEIJI;NAKAI HIDEYUKI |
| 分类号 |
G03F7/004;G02B5/00;G02B5/20;G02B5/22;G03F7/027 |
主分类号 |
G03F7/004 |
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