发明名称 Device for sealing a projection exposure apparatus
摘要 A projection exposure apparatus is equipped with an illumination system, a reticle, a projection objective and an image plane. Interstitial spaces between the individual elements of the apparatus are open to the ambient space. A gas purge device which carries a stream of noble gas or nitrogen is arranged in at least one of the interstitial spaces. The gas purge device is of a shape and size so that one or more interstitial spaces are at least to a large extent sealed off from the ambient space surrounding the projection apparatus.
申请公布号 US2005206860(A1) 申请公布日期 2005.09.22
申请号 US20050067315 申请日期 2005.02.25
申请人 CARL ZEISS SMT AG 发明人 HOF ALBRECHT;MAUL GUENTER;GAIL LOTHAR;SCHIERHOLZ WILFRIED;JOST EBERHARD
分类号 G03B27/52;G03F7/20;(IPC1-7):G03B27/52 主分类号 G03B27/52
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