发明名称 |
Device for sealing a projection exposure apparatus |
摘要 |
A projection exposure apparatus is equipped with an illumination system, a reticle, a projection objective and an image plane. Interstitial spaces between the individual elements of the apparatus are open to the ambient space. A gas purge device which carries a stream of noble gas or nitrogen is arranged in at least one of the interstitial spaces. The gas purge device is of a shape and size so that one or more interstitial spaces are at least to a large extent sealed off from the ambient space surrounding the projection apparatus.
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申请公布号 |
US2005206860(A1) |
申请公布日期 |
2005.09.22 |
申请号 |
US20050067315 |
申请日期 |
2005.02.25 |
申请人 |
CARL ZEISS SMT AG |
发明人 |
HOF ALBRECHT;MAUL GUENTER;GAIL LOTHAR;SCHIERHOLZ WILFRIED;JOST EBERHARD |
分类号 |
G03B27/52;G03F7/20;(IPC1-7):G03B27/52 |
主分类号 |
G03B27/52 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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