发明名称 |
Negative resist process with simultaneous development and aromatization of resist structures |
摘要 |
The invention relates to a process for producing amplified negative resist structures in which, following exposure and contrasting of the resist, the resist structure is simultaneously developed and aromatized. This substantially simplifies the production of amplified resist structures. Amplifying agents include compounds having not only a reactive group for attachment to an anchor group of the polymer, but also at least one aromatic group.
|
申请公布号 |
US6946236(B2) |
申请公布日期 |
2005.09.20 |
申请号 |
US20020186648 |
申请日期 |
2002.07.01 |
申请人 |
INFINEON TECHNOLOGIES AG |
发明人 |
ROTTSTEGGE JOERG;KUEHN EBERHARD;ESCHBAUMER CHRISTIAN;FALK GERTRUD;SEBALD MICHAEL |
分类号 |
G03F7/32;G03F7/40;(IPC1-7):G03F7/20;G03F7/004;G03F7/30;G03F7/38 |
主分类号 |
G03F7/32 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|