SELF-CLEANING CATALYST CHEMICAL VAPOR DEPOSITION DEVICE AND CLEANING METHOD THEREFOR

摘要

A self-cleaning catalyst chemical vapor deposition device capable of preventing the corrosion and deterioration of a catalyst element by a cleaning gas without heating the catalyst element to at least 2000aeC, and realizing pratical, low-cost cleaning speed and satisfactory cleaning. When a cleaning gas containing a halogen element is introduced into a evacuated reaction vessel (2) to heat the catalyst element (4) by current supply from the heating power supply (6), and active species produced by this heating is allowed to react with a deposited film on the inside of the reaction vessel (2) to remove the deposited film, with heating power supply (6) and conductors (5a, 5b) feeding a constant current from between respective terminals (6a, 6b) of the power supply (6) to a catalyst element (4) in a reaction vessel (2) kept electrically insulated from the reaction vessel (2), a proper value of dc bias voltage is applied to the conductor (5b) of the heating power supply (6) with a proper polarity from a constant-voltage power supply (8).