| 摘要 |
PROBLEM TO BE SOLVED: To obtain a composition for an antireflection film capable of suppressing unevenness on the coating surface when the antireflection film is obtained using the die-coating method. SOLUTION: The composition for the antireflection film used for a coating apparatus for forming a thin film by the die coating method comprises at least a UV-curable resin, a metal oxide, a curing agent and at least one solvent, wherein at least one solvent contained has a vapor pressure of not lower than 0.3 kPa and not higher than 3.5 kPa. Preferably, a polar solvent is used as the solvent. COPYRIGHT: (C)2005,JPO&NCIPI
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