| 发明名称 |
Semiconductor device and method of forming the same |
| 摘要 |
A semiconductor device including a resistor and a method of forming the same. In the semiconductor device, a conductive pattern, which connects source regions, and a resistor are formed of the same material, which can be polysilicon. In the method, the conductive pattern and the resistor are simultaneously formed. Thus, it is possible to obtain a constant sheet resistance without an additional photo mask.
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| 申请公布号 |
US2005202606(A1) |
申请公布日期 |
2005.09.15 |
| 申请号 |
US20050055928 |
申请日期 |
2005.02.10 |
| 申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
PARK JIN-TAEK;KIM HONG-SOO |
| 分类号 |
H01L27/04;H01L21/02;H01L21/822;H01L21/8247;H01L27/06;H01L27/10;H01L27/115;H01L29/788;H01L29/792;(IPC1-7):H01L21/00 |
主分类号 |
H01L27/04 |
| 代理机构 |
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代理人 |
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