发明名称 [PHOTOMASK POSITIONING APPARATUS]
摘要 A photomask positioning apparatus comprises a positioning device having a base, one end of which comprises a bended fixed portion connected to a bottom of the containing space and the other of which is away from the fixed portion comprises a bended positioning portion such that a photomask can be positioned between the positioning portion set at the two sides of the containing space.
申请公布号 US2005200829(A1) 申请公布日期 2005.09.15
申请号 US20040710542 申请日期 2004.07.20
申请人 GUDENG PRECISION INDUSTRIAL CO., LTD. 发明人 CHIU MING-CHIEN
分类号 G03B27/60;(IPC1-7):G03B27/60 主分类号 G03B27/60
代理机构 代理人
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