发明名称 |
[PHOTOMASK POSITIONING APPARATUS] |
摘要 |
A photomask positioning apparatus comprises a positioning device having a base, one end of which comprises a bended fixed portion connected to a bottom of the containing space and the other of which is away from the fixed portion comprises a bended positioning portion such that a photomask can be positioned between the positioning portion set at the two sides of the containing space.
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申请公布号 |
US2005200829(A1) |
申请公布日期 |
2005.09.15 |
申请号 |
US20040710542 |
申请日期 |
2004.07.20 |
申请人 |
GUDENG PRECISION INDUSTRIAL CO., LTD. |
发明人 |
CHIU MING-CHIEN |
分类号 |
G03B27/60;(IPC1-7):G03B27/60 |
主分类号 |
G03B27/60 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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