METHOD FOR FORMING PATTERNS ALIGNED ON EITHER SIDE OF A THIN FILM

摘要

The formation of patterns (11, 22) aligned on both sides of a thin film (3) comprises: (a) the formation, on a substrate, of a structure made up of a first pattern layer and the thin film; (b) the formation of a first mark; (c) engraving of the first pattern layer to form a first pattern aligned with the first mark; (d) deposition of an adhesive layer (13) covering the first mark and the first pattern; (e) turning the structure; (f) suppression of the substrate; (g) the formation, by engraving of the adhesive layer, of a second mark (16) at the position of the first mark; (h) deposition of a second pattern layer; and (i) engraving the second pattern layer to form the second pattern aligned with the second mark.