STAGE APPARATUS AND PROJECTION EXPOSURE APPARATUS

摘要

A stage apparatus capable of suppressing influence on optical position measurement caused by a heat source of a stage. The stage device has a supporting base (17X) for holding an object and movable in at least one predetermined direction, a reflection surface (18X) fixed to the supporting base and reflecting a light flux for position measurement, the light flux being projected from the rear when the supporting base moves in the predetermined direction, and a cowl section (19) fixed to the supporting base and having a surface shape baffling an airflow occurring in a space behind the reflection plate when the supporting base moves in the predetermined direction. The baffled airflow (orderly airflow) prevents entrainment of a high-temperature gas present in the lower part of the supporting base.