Sample surface inspection method and inspection system

摘要

An electron gun irradiates a sample with electron beam. A sample stage holds the sample. A detector detects the electron having the information on the surface of the sample through irradiation of the electron beam toward the sample. An image of the sample surface is created according to the electron detected by the detector. A comparison inspection is performed by comparing the created image with a reference image. An inspection system is controlled so as to inspect some area on the sample surface selectively. A selective inspection is enabled. In a semiconductor inspection system using the electron beam, throughput is improved.