发明名称 |
Lithographic apparatus and device manufacturing method |
摘要 |
A detector, feedback and compensation system for use with a radiation distribution system for distributing the radiation from a radiation system to two or more arrays of individually controllable elements, each for patterning beams of radiation, which are subsequently projected onto a substrate. The detector determines the radiation lost in the radiation distribution system and feeds this information back to a compensation system, which compensates for the loss and keeps the radiation projected onto the substrate uniform.
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申请公布号 |
US2005195380(A1) |
申请公布日期 |
2005.09.08 |
申请号 |
US20040790257 |
申请日期 |
2004.03.02 |
申请人 |
SYTSMA JOOST;DE JAGER PIETER W.H. |
发明人 |
SYTSMA JOOST;DE JAGER PIETER W.H. |
分类号 |
G03F7/20;H01L21/027;(IPC1-7):G03B27/52 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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