发明名称 SYSTEM FOR TREATING BASIC GAS
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a system for efficiently treating a basic substance in basic material-containing gas which is capable of stably reducing the diffusion of the basic gas to environment. <P>SOLUTION: A washing apparatus in which the basic substance in the basic material-containing gas is brought into contact with water, acid or oxide and is treated is combined with a backup apparatus having a mechanism which receives the gas subjected to adsorption treatment discharged from the washing apparatus, permits the adsorption treatment and desorption treatment of the basic gas leaking in the treated gas and permits the conveyance of the treated gas to the washing apparatus. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p>
申请公布号 JP2005238044(A) 申请公布日期 2005.09.08
申请号 JP20040049064 申请日期 2004.02.25
申请人 TOYOBO CO LTD 发明人 SUGIURA TSUTOMU
分类号 B01D53/58;B01D53/54;B01J20/26;B01J20/28;(IPC1-7):B01D53/58 主分类号 B01D53/58
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