发明名称 THIN FILM TRANSISTOR, METHOD FOR MANUFACTURING SAME CIRCUIT THEREOF, ELECTRONIC DEVICE AND ELECTRONIC APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a method for manufacturing a thin film transistor capable of manufacturing a thin film transistor with good characteristics, the thin film transistor to be manufactured by the method for manufacturing the thin film transistor, a thin film transistor circuit provided with the thin film transistor, an electronic device and an electronic apparatus. SOLUTION: The method for manufacturing the thin film transistor comprises the steps of feeding, onto a substrate formed with a source electrode and a drain electrode, a liquefied material containing an organic semiconductor layer forming material and a first gate insulating layer forming material which are insoluble to each other, and a solvent which can dissolve both the materials to form a liquefied layer 9; and of removing the solvent from in the liquefied layer 9, with the result that a first domain 91' mainly containing the organic semiconductor layer forming material and a second domain 92' mainly containing the first gate insulating layer forming material are isolated from each other in a thickness direction of the liquefied layer 9 to be also solidified, to obtain an organic semiconductor layer and a first gate insulating layer. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005243822(A) 申请公布日期 2005.09.08
申请号 JP20040050099 申请日期 2004.02.25
申请人 SEIKO EPSON CORP 发明人 KAWASE TAKEO
分类号 H01L21/368;H01L21/336;H01L21/47;H01L29/786;H01L51/00;H01L51/05;(IPC1-7):H01L21/336 主分类号 H01L21/368
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