首页
产品
黄页
商标
征信
会员服务
注册
登录
全部
|
企业名
|
法人/股东/高管
|
品牌/产品
|
地址
|
经营范围
发明名称
PLASMA REACTOR FOR PASSIVATING A SUBSTRATE
摘要
申请公布号
KR100512701(B1)
申请公布日期
2005.09.07
申请号
KR19997012082
申请日期
1998.06.24
申请人
发明人
分类号
H01L21/302;H01L21/3213;H01J37/32;H01L21/02;H01L21/3065;H01L21/311;(IPC1-7):H01L21/321
主分类号
H01L21/302
代理机构
代理人
主权项
地址
您可能感兴趣的专利
IMAGE TRANSMITTER
SWITCHING DIVERSITY SYSTEM WIRELESS COMMUNICATIONS DEVICE
BASE STATION, MOBILE STATION AND MOBILE COMMUNICATION SYSTEM
BASE STATION APPARATUS
ELECTROMAGNETIC WAVE SHIELDING DEVICE
MOLECULAR BEAM CELL CRUCIBLE FOR SILICON
HEAT DISSIPATING MEMBER AND METHOD OF MANUFACTURING SAME
LIGHT EMITTING ELEMENT
LAND PATTERN CONNECTING METHOD
SEMICONDUCTOR DEVICE AND ITS MANUFACTURING METHOD
MOBILE ELECTRONIC EQUIPMENT
HOW TO PRODUCE COMPOUND SEMICONDUCTOR OPTICAL DEVICE
TRANSLUCENT ELECTROMAGNETIC WAVE SHIELDING FILM, TRANSLUCENT ELECTROMAGNETIC WAVE SHIELDING LAMINATE, OPTICAL FILTER AND PLASMA DISPLAY PANEL
ORGANIC ELECTROLUMINESCENT DEVICE, DISPLAY UNIT, AND LIGHTING SYSTEM
PAINT COMPOSITION FOR RADIO WAVE ABSORPTION
SEMICONDUCTOR DEVICE MANUFACTURING METHOD
ORGANIC SEMICONDUCTOR MATERIAL, ORGANIC SEMICONDUCTOR FILM, ORGANIC SEMICONDUCTOR DEVICE AND ORGANIC THIN-FILM TRANSISTOR
CONTACT FOR MEASURING ELECTRONIC COMPONENT
CLEANING METHOD AND DEVICE FOR ELECTRODE IN WELDING METHOD
METHOD AND DEVICE FOR PREVENTING SCATTERING OF FRICTION WASTE PRODUCED BY TIGHTENING SCREW, AND ITS MANUFACTURING PROCESS
