| 发明名称 |
GAS LAYER FORMATION MATERIALS |
| 摘要 |
<p>The present invention provides gas layer formation material selected from the group consisting of acenaphthylene homopolymers; acenaphthylene copolymers; poly(arylene ether); polyamide; B-staged multifunctional acrylate/methacrylate; crosslinked styrene divinyl benzene polymers; and copolymers of styrene and divinyl benzene with maleimide or bis-maleimides. The formed gas layers are used in microchips and multichip modules.</p> |
| 申请公布号 |
EP1570029(A2) |
申请公布日期 |
2005.09.07 |
| 申请号 |
EP20030786554 |
申请日期 |
2003.10.31 |
| 申请人 |
HONEYWELL INTERNATIONAL, INC. |
发明人 |
LI, BO;ZHOU, DE-LING;NAMAN, ANANTH;APEN, PAUL |
| 分类号 |
C08G61/02;C08L65/00;H01L21/312;H01L21/316;H01L21/768;H01L23/522;H01L23/532;(IPC1-7):C10J1/00 |
主分类号 |
C08G61/02 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
