发明名称 |
Porous material air bearing platen for chemical mechanical planarization |
摘要 |
A platen for use in chemical mechanical planarization (CMP) systems includes a platen plate that has at least one recess defined therein. The at least one recess has an input port formed therein. A porous material is disposed in the at least one recess. The porous material has a porosity sufficient to restrict air flow therethrough so as to reduce an amount of air required for a CMP operation.
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申请公布号 |
US6939212(B1) |
申请公布日期 |
2005.09.06 |
申请号 |
US20010029457 |
申请日期 |
2001.12.21 |
申请人 |
LAM RESEARCH CORPORATION |
发明人 |
PHAM XUYEN |
分类号 |
B24B21/04;B24B37/04;(IPC1-7):B24B41/00 |
主分类号 |
B24B21/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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