| 发明名称 |
Method of forming thin film pattern, method of manufacturing device, electro-optical apparatus and electronic apparatus |
| 摘要 |
A method of forming a thin film pattern by placing a functional liquid on a substrate, includes a bank formation step of forming banks in accordance with the thin film pattern on the substrate, a residue processing step of removing residue between the banks, and a material placement step of placing the functional liquid between the banks removed the residue.
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| 申请公布号 |
US2005191781(A1) |
申请公布日期 |
2005.09.01 |
| 申请号 |
US20040803027 |
申请日期 |
2004.03.18 |
| 申请人 |
SEIKO EPSON CORPORATION |
发明人 |
HIRAI TOSHIMITSU |
| 分类号 |
G02F1/13;B05D1/32;B05D3/04;B05D3/06;B05D7/00;G09F9/00;H01L21/00;H01L21/02;H01L21/20;H01L21/28;H01L21/288;H01L21/3205;H01L21/321;H01L21/336;H01L21/768;H01L21/77;H01L21/84;H01L27/32;H01L29/786;H01L51/00;H01L51/50;H05B33/14;H05K3/10;H05K3/12;(IPC1-7):H01L21/00 |
主分类号 |
G02F1/13 |
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