FABRICATION METHOD OF HYBRID PHASE SHIFT MASK,申请号KR20040013549-传众专利搜索

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发明名称	FABRICATION METHOD OF HYBRID PHASE SHIFT MASK
摘要
申请公布号	KR20050087625(A)	申请公布日期	2005.08.31
申请号	KR20040013549	申请日期	2004.02.27
申请人	HYNIX SEMICONDUCTOR INC.	发明人	EOM, TAE SEUNG
分类号	G03F1/26;G03F1/70;(IPC1-7):G03F1/08	主分类号	G03F1/26
代理机构		代理人
主权项
地址

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