发明名称 Method and apparatus for the monitoring and control of a semiconductor manufacturing process
摘要 An Advanced Process Control (APC) system including Graphical User Interfaces (GUIs) is presented for monitoring and controlling a semiconductor manufacturing process that is performed by a semiconductor processing system. The semiconductor processing system includes a number of processing tools, a number of processing modules (chambers), and a number of sensors, and the APC system comprises an APC server, database, interface server, client workstation, and GUI component. The GUI is web-based and is viewable by a user using a web browser.
申请公布号 US2005187649(A1) 申请公布日期 2005.08.25
申请号 US20050087071 申请日期 2005.03.23
申请人 TOKYO ELECTRON LIMITED 发明人 FUNK MERRITT;PETERSON RAYMOND
分类号 G05B19/418;G05B23/02;H01L21/00;H01L21/66;(IPC1-7):G06F19/00 主分类号 G05B19/418
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