发明名称 PULSE ELECTRON BEAM IRRADIATION EQUIPMENT
摘要 <P>PROBLEM TO BE SOLVED: To unify dose distribution in electron beam irradiation using a pulse electron beam to a processing object in a carrying state. <P>SOLUTION: A pulse electron beam irradiation equipment irradiates a pulse electron beam with a beam irradiation frequency Fb to the object being carried at carrying velocity Vc by scanning with a scan width W and a beam scan frequency Fs. When the carrying velocity Vc and the scan width W are set to fixed values and either of the beam irradiation frequency Fb and the beam scan frequency Fs is set a fixed value, the other one of the beam irradiation frequency Fb or the beam scan frequency Fs is optimized so that the dose distribution of the pulse electron beam becomes most uniform. <P>COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005227024(A) 申请公布日期 2005.08.25
申请号 JP20040033676 申请日期 2004.02.10
申请人 ISHIKAWAJIMA HARIMA HEAVY IND CO LTD 发明人 SHIRAKAWA TADAHIDE
分类号 G21K5/04;A23L3/26;A61L2/08;G21K5/10 主分类号 G21K5/04
代理机构 代理人
主权项
地址
您可能感兴趣的专利