发明名称 CLEANING MASKS
摘要 A method and apparatus for cleaning masks is described. In one embodiment, the invention is a method of cleaning a mask. The method includes placing the mask in a cleaning solution. The method also includes agitating the cleaning solution at a predetermined agitation level for a predetermined period of time.
申请公布号 WO2005010947(A3) 申请公布日期 2005.08.18
申请号 WO2004US23596 申请日期 2004.07.22
申请人 CHEMTRACE PRECISION CLEANING, INC. 发明人 TAN, SAMANTHA;WANG, JIANQI
分类号 B08B3/04;B08B3/10;C23G1/02;C23G3/00;H01L21/00 主分类号 B08B3/04
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