Dielectric multilayer filter and its manufacturing method, and solid-state imaging device

摘要

The invention relates to providing a dielectric multilayer filter capable of minimizing the incident angle of light with respect to its dielectric multilayer film capable which reflects light of a given wavelength such as infrared light and making the angular dependence of the dielectric multilayer film as small as possible. A dielectric multilayer filter 1 including: a light-transmissive substrate 2 having a flat surface at least one side thereof; a dielectric multilayer film 3 formed on the flat surface of the light-transmissive substrate 2, the dielectric multilayer film reflecting light of a particular wavelength; and a resin focusing lens 4 glued on the at least one side of the light-transmissive substrate 2. The dielectric multilayer filter 1 is used as a dust-tight cover of the solid-state imaging element's device 100.