Photosensitive bilayer composition

摘要

Polymers and co-polymers having monomeric units formed by the polymerization of monomers of the Structure I where R¹ is a moiety containing an ethylenically unsaturated polymerizable group, R² is a C₁-C₃ alkylene group, and R³ is a C_1-10 linear or cyclic alkyl group, a C_6-10 aromatic or substituted aromatic group, a C_1-8 alkoxy methyl, or a C_1-8 alkoxy ethyl group, are useful as binder resins for photosensitive compositions, and processes for photolithography in the production of semiconductor devices and materials.