发明名称 SEMICONDUCTOR DEVICE AND ITS PRODUCTION PROCESS
摘要 <p><P>PROBLEM TO BE SOLVED: To obtain a thin semiconductor device in which a semiconductor structure, referred to as a CSP, is provided on a base plate, an insulation layer is provided on the base plate around the semiconductor structure, upper layer wiring is provided on the semiconductor structure and the insulation layer, and a solder ball is provided on the connection pad of the upper layer wiring. <P>SOLUTION: Lower surface of the silicon substrate 3 of a semiconductor structure 2 is bonded directly to the upper surface of a base plate 1 composed of a prepreg material. Thickness is reduced by an amount corresponding to the thickness of an adhesive layer as compared with a case where the lower surface of the silicon substrate 3 of the semiconductor structure 2 is bonded to an upper surface of a base plate 1 through an adhesive layer of die bond material. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p>
申请公布号 JP2005216936(A) 申请公布日期 2005.08.11
申请号 JP20040018536 申请日期 2004.01.27
申请人 CASIO COMPUT CO LTD 发明人 MIHARA ICHIRO
分类号 H01L23/52;H01L21/3205;H01L21/44;H01L21/60;H01L23/053;H01L23/12;H01L23/31;H01L23/485;H01L23/538;H01L25/04;H01L25/18;(IPC1-7):H01L23/12;H01L21/320 主分类号 H01L23/52
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