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发明名称
Substrate processing apparatus for performing exposure process in gas atmosphere
摘要
申请公布号
KR100505762(B1)
申请公布日期
2005.08.03
申请号
KR20050016172
申请日期
2005.02.25
申请人
发明人
分类号
H01L21/027;H01L21/20;H01L21/00;(IPC1-7):H01L21/20
主分类号
H01L21/027
代理机构
代理人
主权项
地址
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