发明名称 |
Cleaning of CVD chambers using remote source with cxfyoz based chemistry |
摘要 |
A method and apparatus for cleaning a processing chamber are provided. The cleaning method includes the use of a remote plasma source to generate reactive species and an in situ RF power to generate or regenerate reactive species. The reactive species are generated from a carbon and fluorine-containing gas and an oxygen source.
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申请公布号 |
US6923189(B2) |
申请公布日期 |
2005.08.02 |
申请号 |
US20030346836 |
申请日期 |
2003.01.16 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
LAKSHMANAN ANNAMALAI;LEE JU-HYUNG;KIM TROY;ZHAO MAOSHENG;VENKATARAMAN SHANKAR |
分类号 |
B08B7/00;C23C16/44;(IPC1-7):B08B9/093 |
主分类号 |
B08B7/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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