METAL PATTERN AND PROCESS FOR PRODUCING THE SAME

摘要

Metal pattern (13') obtained through formation on a substrate surface and etching, which metal pattern (13') has masking film (18) formed through adsorption of a monomolecular film containing fluorinated alkyl chains (CF3(CF2)n-: n is a natural number) on a metal film surface and penetrating of a molecule having mercapto (-SH) or disulfido (-SS-) into interstices between molecules constituting the monomolecular film. This metal pattern is produced by forming a monomolecular film containing fluorinated alkyl chains (CF3(CF2)n-: n is a natural number) on a metal film surface; coating the surface of the monomolecular film with a solution in which a molecule having mercapto (-SH) or disulfido (-SS-) is dissolved so that the molecule having mercapto (-SH) or disulfido (-SS-) penetrates into interstices between molecules constituting the monomolecular film to thereby form a masking film; and exposing the metal film surface to an etching solution to thereby waste metal region devoid of the masking film.