发明名称 Semiconductor die de-processing using a die holder and chemical mechanical polishing
摘要 A method and apparatus for removing layers from a circuit side of a semiconductor die includes the use of a holder, for example a semiconductor wafer having an opening therein for receiving the semiconductor die. Additionally the holder can include one or more layers thereover which are removed at a similar rate as those layers which comprise the semiconductor die. A die is placed into the opening and a circuit side of the die is aligned with a front side of the holder, for example using a generally planar surface, and is secured to the holder with an adhesive material. Using a holder reduces uneven layer removal which is known to occur in conventional processing, for example excessive removal at the edges of the die. A potting jig which aids in aligning and securing the die to the holder is also described.
申请公布号 US6921318(B2) 申请公布日期 2005.07.26
申请号 US20010885314 申请日期 2001.06.19
申请人 MICRON TECHNOLOGY, INC. 发明人 CARSON BRYAN C.;MOORE SCOTT E.
分类号 B24B37/04;H01L21/306;(IPC1-7):B24B1/00 主分类号 B24B37/04
代理机构 代理人
主权项
地址