发明名称 |
Substrate brush scrubbing and proximity cleaning-drying sequence using compatible chemistries, and method, apparatus, and system for implementing the same |
摘要 |
A method for cleaning and drying a front and a back surface of a substrate is provided. The method includes brush scrubbing the back surface of the substrate using a brush scrubbing fluid chemistry. The method further includes applying a front meniscus onto the front surface of the substrate upon completing the brush scrubbing of the back surface. The front meniscus includes a front cleaning chemistry that is chemically compatible with the brush scrubbing fluid chemistry.
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申请公布号 |
US2005155629(A1) |
申请公布日期 |
2005.07.21 |
申请号 |
US20040816432 |
申请日期 |
2004.03.31 |
申请人 |
LAM RESEARCH CORP. |
发明人 |
RAVKIN MICHAEL;DE LARIOS JOHN M. |
分类号 |
H01L21/00;(IPC1-7):B08B7/00 |
主分类号 |
H01L21/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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