| 摘要 |
PROBLEM TO BE SOLVED: To provide an exposure device and an exposure method wherein time duration to resumption of operation after maintenance, power failure etc. is shortened, and stopping time can be shortened as much as possible. SOLUTION: Information is sent to an exposure device precision judging machine 40 from a temperature sensor 30, a reticle microscope 15, an interferometer 17, a sensor 18, a wafer alignment microscope 19, a flowmeter F, and a keyboard K. Disturbance informations, such as aperture time duration and position of the opening 23 of an environmental chamber 20, contents of work at the time of releasing, the temperature of air outside the environmental chamber 20 at the time of releasing and operation shut down time duration of the environmental chamber 20 are sent from the keyboard K. On the basis of these informations, various data which are stored in a memory beforehand, etc., the exposure device precision judging machine 40 selects any one out of a stoppage of exposure operation, exposure operation accompanied by correction operation, and regular exposure operation, and transmits a control signal to an exposure operation controller 50. The exposure operation controller 50 controls the operation of the exposure device 10 based on the control signal from the exposure device precision judging machine 40. COPYRIGHT: (C)2005,JPO&NCIPI
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