| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a new polymer capable of forming a resist useful for microprocessing using radiation and to provide a resist composition comprising the polymer. <P>SOLUTION: The polymer is represented by formula 1 wherein X is one or more kinds of derivatives selected from the group consisting of a 3-30C vinyl ether derivative, a styrene derivative, a maleic anhydride derivative and an olefin derivative having no electron withdrawing functional group at a position of the double bond; R<SB>1</SB>and R<SB>3</SB>are each independently one or more kinds of groups selected from the group consisting of a hydrogen atom, a 1-30C alkyl group, a 1-30C alkoxy group, a halogen-substituted alkyl group and a halogen-substituted alkoxyalkyl group; and R<SB>2</SB>is one or more kinds of groups selected from the group consisting of a hydrogen atom, a methyl group and a trifluoromethyl group. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
