发明名称 ELECTRON BEAM DEVICE
摘要 PROBLEM TO BE SOLVED: To enable to carry out evaluation of a sample with a high throughput and a high S/N ratio. SOLUTION: When electron beam irradiated from an electron gun is irradiated on a sample W placed on an X-Y-θstage 9-1 through an electrostatic lens 4-1 and an objective lens 11-1 or the like, secondary electron or reflective electron is emitted from the sample W. An incident angle of the primary electron beam is set at 35°or more through adjustment of a deflector 8-1. Emitted electron from the sample is guided toward the vertical direction to be imaged at a detector. The detector is composed of an MCP 14-1, a phosphor plate 15-1, a relay lens 16-1 and a TDI (or a CCD) 17-1, and electric signals from the TDI 7-1 is supplied to a personal computer 18-1 for image processing to obtain a two-dimensional image of the sample. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005197121(A) 申请公布日期 2005.07.21
申请号 JP20040003202 申请日期 2004.01.08
申请人 EBARA CORP 发明人 WATANABE KENJI;SATAKE TORU;NAKASUJI MAMORU;MURAKAMI TAKESHI;KARIMATA TSUTOMU;NOMICHI SHINJI;TOYAMA KEIICHI;HATAKEYAMA MASAKI
分类号 H01L21/66;H01J37/073;H01J37/12;H01J37/147;H01J37/26;H01J37/29;(IPC1-7):H01J37/29 主分类号 H01L21/66
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