发明名称 Atomare Schichtabscheidung bei programmierbaren Bauelementen
摘要 In an aspect, an apparatus is provided that sets and reprograms the state of programmable devices. In an aspect, a method is provided such that an opening (220) is formed through a dielectric (210) exposing a contact (170), the contact (170) formed on a substrate (100). An electrode (230) is conformally deposited on a wall of the dielectric (210), utilizing atomic layer deposition (ALD). A programmable material (404) is formed on the electrode (230) and a conductor (410) is formed to the programmable material (404). In an aspect, a barrier (408) is conformally deposited utilizing ALD, between the electrode (230) and the programmable material (404).
申请公布号 DE10297784(T5) 申请公布日期 2005.07.14
申请号 DE2002197784T 申请日期 2002.08.21
申请人 OVONYX INC., BOISE 发明人 LOWREY, TYLER A.;DENNISON, CHARLES H.
分类号 H01L27/105;H01L27/10;H01L27/24;H01L45/00;(IPC1-7):H01L45/00 主分类号 H01L27/105
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