发明名称 TFT ARRAY INSPECTION DEVICE
摘要 PROBLEM TO BE SOLVED: To measure the potential intensity on a substrate by calibrating the intensity of a detection signal in a TFT array inspection device. SOLUTION: The TFT array inspection device 1 comprises: an electronic ray source 2 for irradiating electronic rays; a detection means 6 for detecting the electronic rays radiated from the specimen by the irradiation of electronic rays; a specimen potential varying means 7 for varying the specimen potential; and a calibration means for calibrating the detection signal for obtaining the specimen potential by using a calibration curve between the specimen potential and the detection signal intensity, wherein the calibration curve is prepared by the detection signal intensity for the potential variation of the specimen. The potential of the specimen is obtained by calibrating the detected signal intensity using the calibration curve. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005188933(A) 申请公布日期 2005.07.14
申请号 JP20030426759 申请日期 2003.12.24
申请人 SHIMADZU CORP 发明人 IMAI DAISUKE
分类号 G01N23/225;G01R31/302;G01R31/305;G01R35/00;G21K7/00;H01J37/05;H01J37/244;H01J37/26;H01J37/28;H01L27/12;H01L29/786;(IPC1-7):G01R31/302 主分类号 G01N23/225
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