ELECTROSTATIC CHUCK, EXPOSURE SYSTEM, AND SUCTION METHOD OF OBJECT TO BE SUCKED

摘要

PROBLEM TO BE SOLVED: To provide an electrostatic chuck capable of sucking and holding an object to be sucked at the bottom surface with high accuracy, and to provide an exposure system provided with the electrostatic chuck, and a suction method of the object to be sucked to the electrostatic chuck. SOLUTION: An electrostatic chuck 10 has a structure in which electrodes 12a and 12b drivable independently are arranged in a dielectric ceramic body 11. The electrostatic chuck 10 is fixed to the inside of a semiconductor manufacturing apparatus through the side surface and sucks and holds an object to be sucked at the bottom surface. The bottom surface of the dielectric ceramic body 11 sucking and holding the object to be sucked is recessed. Thereby, for example, when a plate-shaped glass mask is held, the deflection of the glass mask is corrected and the flatness of the glass mask can be improved. COPYRIGHT: (C)2005,JPO&NCIPI