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发明名称
APPARATUS FOR LOW TEMPERATURE CHEMICAL VAPOR DEPOSITION
摘要
申请公布号
KR20050071801(A)
申请公布日期
2005.07.08
申请号
KR20040000122
申请日期
2004.01.02
申请人
SAMSUNG SDI CO., LTD.
发明人
CHOUNG, JI YOUNG;LEE, KANG IL;JEONG, SEOK HEON
分类号
H01L21/205;(IPC1-7):H01L21/205
主分类号
H01L21/205
代理机构
代理人
主权项
地址
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