Method for exposing a photosensitive resist layer with near-field light

摘要

In a method for exposing a photosensitive resist layer with near-field light, a liquid film layer is provided between the photosensitive resist layer and a photomask. The photomask has a light-shielding film containing an opening portion whose width is smaller than the wavelength of light emitted from a light source. The photosensitive resist layer is exposed with near-field light through the opening portion and the liquid film layer.