| 摘要 |
In the method according to the invention, scatter lines (2, 3, 4, 5, 6, 7, 8) with a predetermined width are produced, which run at a predetermined distance from selected edges of mask structure elements (1). These scatter lines (2, 3, 4, 5, 6, 7, 8) produced are inspected with regard to compliance with a predetermined distance from adjoining edges of mask structure elements (1) and with regard to compliance with a predetermined distance from one another. Scatter lines (2, 3, 4, 5, 6, 7, 8) which fall below the predetermined distance are shortened and/or eliminated. |
