发明名称 Exposure apparatus and method
摘要 An exposure method includes the steps of introducing fluid between a surface of an object to be exposed, and a final surface of a projection optical system, displacing an interface of the fluid arranged between the surface of the object and the final surface of the projection optical system, and projecting a pattern on a mask onto the object via the projection optical system and the fluid.
申请公布号 US2005140948(A1) 申请公布日期 2005.06.30
申请号 US20040014166 申请日期 2004.12.17
申请人 CANON KABUSHIKI KAISHA 发明人 TOKITA TOSHINOBU
分类号 G03F7/20;H01L21/027;(IPC1-7):G03B27/52 主分类号 G03F7/20
代理机构 代理人
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